| Area Overviews |
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Paul Elias (SARTOMER OAKLANDS Corporate Center, USA) |
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TBA |
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Wenfang Shi (University of Science and Technology of China (USTC), China) |
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Applications and Progress of UV/EB Curing Technology in China |
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Iyer R. Siva (Cytec Industries Inc., China) |
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Overview of UV Technology in Asia |
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Takashi Ukachi (JSR Corporation, Japan) |
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Progress of Radiation Curing Technology and Its Industrial Applications in Japan |
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Sebastien Villeneuve (Ciba Inc., Switzerland) |
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Developments and Trends for Radiation Curing in Printing Applications |
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| Special Sessions |
| S-1: |
Nano Imprint |
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Hiroshi Goto (TOSHIBA MACHINE CO., LTD., Japan) |
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UV Nanoimprint Process and its Application to Micro/Nano Devices |
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Eung-Sug Lee (Korea Institute of Machinery and Materials, Korea) |
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TBA |
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Shinji Matsui (University of Hyogo, Japan) |
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Present State and Prospect of Nanoimprint Technology |
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Nobuji Sakai (Toyo Gosei Co., Ltd., Japan) |
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Photo-Curable Resins for UV Nanoimprint |
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Toshio Teramoto (D-MEC LTD., Japan) |
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Three Dimensional Micro Fabrication by Using Micro Stereo- Lithography Technology |
| S-2: |
Nano Lithography |
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Ralph Dammel (AZ Electronic Materials, USA) |
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The Role of Materials Chemistry in Extending Moore's Law |
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Hiroshi Ito (IBM Almaden Research Center, USA) |
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Resist Materials for Nanolithography |
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Toshiyuki Kai (JSR Corporation, Japan) |
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EUV Resist Development |
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Ichiro Mori (Semiconductor Leading Edge Technologies, Inc., Japan) |
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EUV Lithography: Progress and Challenges |
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Christopher K. Ober (Cornell University, USA) |
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Molecular Glass Resists: Does Small Size Lead to Fine Featured Patterns? |
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Yoshiyuki Ono (NIPPON KAYAKU CO., LTD, Japan) |
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Development of Materials for MEMS Applications |
| S-3: |
Green Technology |
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Le Xuan Hien (Vietnam Academy of Science and Technology, Vietnam) |
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Study of Some UV- Curable Systems Containing Vegetable Oils or Their Derivatives |
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Hideo Ohkita (Kyoto University, Graduate School of Engineering, Japan) |
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Interfacial Design of Donor-Acceptor Heterojunction in Polymer Solar Cells |
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Hiroyuki Yano (Kyoto University, Japan) |
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Research and Application of Cellulose Nanofibre Reinforced Composites |
| S-4: |
New Trend in Display Technology |
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Kunio Akedo (TOYOTA Central R&D Labs., Inc., Japan) |
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Flexible Organic Light-Emitting Diode Displays for Automobiles |
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Dirk J. Broer (Philips Research Laboratories & Eindhoven University of Technology, The Netherlands) |
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Photopolymerization of Ordered Media – Towards Applications in Display Optics and Micro Mechanics |
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Liang-Chy Chien (Kent State University, USA) |
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Light-Driven Anisotropic Phase Separation and Its Application in Flexible Liquid Crystal Displays |
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Allan Guymon (University of Iowa, USA) |
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Nano Structures in Photocured Polymer Materials |
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| General Sessions |
| G-1 |
Equipment: UV/EB Systems, Laser Sources |
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Masatoshi Abe (NICHIA CORPORATION, Japan) |
| G-2 |
Chemistry: Monomers, Laser Sources, Pre Polymers, Additives, Reaction Mechanisms |
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Kurt Dietliker (Ciba Inc., Switzerland) |
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Photolatent Catalysts: UV Curing beyond Radicals and Acid |
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Charles E. Hoyle (University of Southern Mississippi, USA) |
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Thermal and Mechanical Properties of Cross-Linked Photopolymers Based on Multifunctional Thiol-Urethane |
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Ene Monomers |
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Mike J. Idacavage (Cytec Industries Inc. , USA) |
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High RI UV Curable Materials for Light Management Coatings in Electronics Applications |
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Mats Johansson (Royal Institute of Technology, Sweden) |
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Thiols in Radcure Systems |
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Hisatoshi Kura (Ciba Japan K.K., Japan) |
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Recent Development of Radical Photoinitiators in Electronics |
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Tim Myers (Corning Inc., USA) |
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TBA |
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Jun Nie (Beijing University of Chemical Technology, China) |
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Synthesis and Photopolymerization of Nitrogen-contained Monomers |
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Jane Sum (Bayer MaterialScience Trading Shanghai Co. Ltd., China) |
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Latest Developments for Radiation Curing Raw Materials for High Quality Industrial Coatings |
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Qui Tran-Cong-Miyata (Kyoto Institute of Technology, Japan) |
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Intrinsic Inhomogeneity of Reactions and Its Consequence on Phase Separation in Photoreactive |
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Multicomponent Polymer Mixtures |
| G-3 |
Performance Measurement / Testing: Dosimetry, Degree of Curing, Physical/Chemical Properties |
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Xavier Allonas (University of Haute Alsace, France) |
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Silicon Based Photoinitiators and Coinitiators for Radical Polymerization Exhibiting Low Oxygen Sensitivity |
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Paul F. Barbara (University of Texas at Austin, USA) |
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Deep Trapping of Charges in Conjugated polymer Films. |
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Johan Hofkens (Katholieke Universiteit, The Netherlands) |
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TBA |
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Sadahiro Masuo (Kyoto Institute of Technology, Japan) |
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Photon Antibunching of Nanometer-sized Emitters |
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Robin E. Wright (3M, USA) |
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Estimating Emissions from Thin Radiation-Curable Coatings |
| G-4: |
Applications: |
| G-4-1 |
Printings: Publishing, Packaging, Others |
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Nigel Caiger (Director Global Digital Technology, Sun Chemical Ltd., UK) |
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UV-curing Inkjet Ink Developments |
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Juanita Parris (Sun Chemical Corporation, USA) |
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The WetFlex Printing Process |
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Kenji Suzuki (Collins Ink Corp., USA) |
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The Ink Properties and Curability of UV Curable Inkjet Ink |
| G-4-2 |
Coatings: Wood, Metals, Inorganic Materials, Plastics, Papers |
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Toshikatsu Kobayashi (NipponPaint Co., Ltd., Japan) |
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Nano-sized Noble Metal Particles as a Novel Colorant for Coatings |
| G-4-3 |
Adhesives: Laminating, Pressure Sensitive, Release Coating |
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Yangsoo Lee (Sekisui Chemical. Co., Ltd., Japan) |
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Heat-resistant Self-releasing Adhesive Tape and its Application |
| G-4-4 |
Photofabrications: 3D-Fabrication, Micro-and Nano Fabrications |
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Sang-Ouk Kim (KAIST, Korea) |
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Directed Assembly of Block Copolymers |
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Atsushi Takahara (Kyushu University, Japan) |
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Fabrication of Patterned Organosilane Monolayers by VUV Lithography and Their Applications |
| G-4-5 |
Electronics: UV/EB and X-Ray Resists, Printed Circuits Boards, Lithographic Process |
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Tsuyoshi Watanabe (JSR Corporation, Japan) |
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TBA |
| G-4-6 |
Information Transfer and Recording: Optical Fibers, Magnetic Media, Optical Media |
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Yasuhiro Koike ((1)Keio University, (2)Japan Science and Technology Agency, Japan) |
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Novel Photonics Polymers for High-Quality Display |
| G-4-7 |
Biological and Medical |
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Akihiko Kikuchi (Tokyo Universty of Science, Japan) |
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Preparation of Thermoresponsive surfaces for Tissue Engineering Applications |
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Sunil Sabharwal (Bhabha Atomic Research Centre, India) |
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TBA |
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Young-Chang Nho (Korean Atomic Enregy Research Institute, Korea) |
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TBA |
| G-5 |
Safety and Handling |
| G-6 |
Emerging Technologies |
